Seal Main Cure/Annealing Oven /CF Post Bake
Seal Main Cure/Annealing Oven /CF Post Bake
Product Contact
Julia Hsu
- Substrate size：G3.5~G10.5
- Temperature range：120℃~350℃
- Excellent temperature uniformity：≦±3℃
- O2 control：3%~30%, ±1%
- Cleanliness level：Class 10/100/1,000
- Transportation：Robot
- Recipe edit
- Application
Array：annealing oven
CF：CF post bake
Cell：seal main cure
Others：touch panel, cover lens - Patented stacking shutter design allows smaller pitch, gains more capacity
- Original design of solvent treatment system
- Multiple zone control to achieve superior temperature uniformity
- Apply APC to collect EQ data. real time error diagnose and classify
- Customer base：AUO, InnoLux, HSD, CPT, Qualcomm, CANDO, WINTEK, BOE, CSOT, CEC, HKC, CHOT, TIANMA and IVO etc., selling over 500 sets
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